Bridging the Sim-to-Real Gap in Semiconductor Visual Program Synthesis via Input Binarization

Precise parametric control over circuit geometry is essential for semiconductor inspection, yet obtaining sufficient real training data remains costly. Although generative models such as diffusion models and Generative Adversarial Networks (GANs) can augment training data, they cannot guarantee the nanometer-scale geometric accuracy required for metrology tasks. We propose a visual program synthesis framework in which a Vision-Language Model (VLM) converts inspection images into editable Domain-