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trimethylsilane
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Trimethylsilane is the organosilicon compound with the formula (CH3)3SiH. It is a colorless gas. It is a trialkylsilane. The Si-H bond is reactive. Being a gas, it is less commonly used as a reagent than the related triethylsilane, which is a liquid at room temperature.
Chemical data
- Formula
- C3H10Si
- Molecular weight
- 74.2 g/mol
- IUPAC name
- trimethylsilane
- SMILES
- C[SiH](C)C
- InChIKey
- PQDJYEQOELDLCP-UHFFFAOYSA-N
- Polar surface area
- 0 Ų
- H-bond donors
- 0
- H-bond acceptors
- 0
- Formal charge
- 0
via PubChem
Wikidata facts
- Subclass of
- chemical compound
- Has part
- hydrogen
- Mass
- 74.055
Show 3 more facts
- canonical SMILES
- C[SiH](C)C
- chemical formula
- C₃H₁₀Si
- Commons category
- Trimethylsilane
via Wikidata · CC0
~1 min read
Encyclopedic overview
2 sectionsContents
- See also
- References
Trimethylsilane is the organosilicon compound with the formula (CH3)3SiH. It is a colorless gas. It is a trialkylsilane. The Si-H bond is reactive. Being a gas, it is less commonly used as a reagent than the related triethylsilane, which is a liquid at room temperature.
Trimethylsilane is used in the semiconductor industry as precursor to deposit dielectrics and barrier layers via plasma-enhanced chemical vapor deposition (PE-CVD). It is also used a source gas to deposit TiSiCN hard coatings via plasma-enhanced magnetron sputtering (PEMS). It has also been used to deposit silicon carbide hard coatings via low-pressure chemical vapor deposition (LP-CVD) at relatively low temperatures under 1000 °C. It is an expensive gas but safer to use than silane (SiH4); and produces properties in the coatings that cannot be undertaken by multiple source gases containing silicon and carbon.
Excerpted from Wikipedia’s “trimethylsilane” article, available under the CC BY-SA 4.0 licence.