ellipsometry
Sign in to savethumb|An Ellipsometer at Laboratory for Analysis and Architecture of Systems|LAAS-CNRS in Toulouse, France Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry measures the change of polarization upon reflection or transmission and compares it to a model.
Article
21 sectionsContents
- Etymology
- Basic principles
- Experimental details
- Experimental setup
- Data acquisition
- Data analysis
- Definitions
- Single-wavelength vs. spectroscopic ellipsometry
- Standard vs. generalized ellipsometry (anisotropy)
- Jones matrix vs. Mueller matrix formalism (depolarization)
- Advanced experimental approaches
- Imaging ellipsometry
- In situ ellipsometry
- Ellipsometric porosimetry
- Magneto-optic generalized ellipsometry
- Ellipsometry in semiconductor manufacturing
- Applications
- Advantages
- See also
- References
- Further reading
thumb|An Ellipsometer at Laboratory for Analysis and Architecture of Systems|LAAS-CNRS in Toulouse, France Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry measures the change of polarization upon reflection or transmission and compares it to a model.
It can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.