
thumb|An Ellipsometer at Laboratory for Analysis and Architecture of Systems|LAAS-CNRS in Toulouse, France Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry measures the change of polarization upon reflection or transmission and compares it to a model.
thumb|An Ellipsometer at Laboratory for Analysis and Architecture of Systems|LAAS-CNRS in Toulouse, France Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry measures the change of polarization upon reflection or transmission and compares it to a model.
It can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.
Discovered by embedding cosine similarity (sentence-transformers MiniLM, 384-dim).