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dichlorosilane
Sign in to saveDichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH3 (i.e. 16:1), usually results in lower stress nitride films.
Chemical data
- Formula
- Cl2H2Si
- Molecular weight
- 101 g/mol
- IUPAC name
- dichlorosilane
- SMILES
- [SiH2](Cl)Cl
- InChIKey
- MROCJMGDEKINLD-UHFFFAOYSA-N
- Polar surface area
- 0 Ų
- H-bond donors
- 0
- H-bond acceptors
- 0
- Formal charge
- 0
via PubChem
Wikidata facts
- Mass
- 99.930282
Show 7 more facts
- electric dipole moment
- 1.17
- boiling point
- 8.3
- chemical formula
- Cl₂H₂Si
- Commons category
- Dichlorosilane
- canonical SMILES
- [SiH2](Cl)Cl
- ionization energy
- 11.40
- melting point
- -122
via Wikidata · CC0
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Article
9 sectionsContents
- History
- Reactions and formation
- Hydrolysis
- Decomposition
- Ultrapurification
- Advantage of use
- Safety hazards
- References
- External links
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH3 (i.e. 16:1), usually results in lower stress nitride films.
==History== Dichlorosilane was originally prepared by Stock and Somieski by the reaction of SiH4 with hydrogen chloride. Dichlorosilane reacts with water vapor to initially give monomeric prosiloxane: Monomeric polymerizes rapidly upon condensation or in solution.