
A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry.
Fotorezyst – rodzaj emulsji światłoczułej stosowany głównie w fotolitografii oraz fotograwerowaniu do wytworzenia odpowiedniego wzoru na podłożu.
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Discovered by embedding cosine similarity (sentence-transformers MiniLM, 384-dim).